シャッフルカジノ 入金不要ボーナス ProductionNE-5700/NE-7800
Etching System

シャッフルカジノ 入金不要ボーナス ProductionNE-5700/NE-7800

シャッフルカジノ 入金不要ボーナス
シャッフルカジノ 入金不要ボーナス

シャッフルカジノ 入金不要ボーナス high volume production with good cost performance and wide selection of tool configuration.

シャッフルカジノ 入金不要ボーナス
シャッフルカジノ 入金不要ボーナス

Features

  • In addition to ICP type chamber, NLD plasma etching chamber, Ashing chamber or CCP chamber can be selected.
  • Thanks to STAR Electrode (ULVAC Patent) and various temperature control functions, good process repeatability and stability can be achieved.
  • Low downtime thanks to simple maintenance structure.
  • Full process support from ULVAC Institute for Semiconductor and Electronics Technologies.

Applications

  • Compound semiconductor (LED, LD and RF devices), Power devices (IGBT, SiC)
  • Metal, Dielectric, Polymer, Gate electrode etching
  • Ferro electric material, Noble metal etching
  • Ferro magnetic material etching

This website use cookies to obtain and use access data to understand the convenience and usage of customers. If you agree to use cookies, click "I Accept".
個人シャッフルカジノ 入金方法保護方針 [Cookie Policy]

I Accept