シャッフルカジノ 初回入金ボーナスg Systemfor Opto-Devices, MEMSNLD-5700
Etching System

シャッフルカジノ 初回入金ボーナスg System
for Opto-Devices, MEMSNLD-5700

シャッフルカジノ 初回入金ボーナス

Production type シャッフルカジノ 初回入金ボーナスg system with ULVAC original NLD (Neutral Loop Discharge) Plasma Source.

シャッフルカジノ 初回入金ボーナス

Features

  • ICP type etching chamber, CCP or Ashing chamber is also selectable as 2nd chamber.
  • Low process pressure, high density plasma, low electron temperature are perfect for quartz glass, Pyrex, LN, LT etc.
  • Good profile control and surface roughness.
  • Good performance of deep SiO2 etching with PR.
  • High etching rate of Quartz 1μm/min, Pyrex 0.8 μm/min.
  • Excellent uniformity control.

Applications

  • Optical Devices (Wave guide, amplifier, optical switch etc), Micro lens, Photonics, μ-TAS etc.

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