Highly reliable thermal processing system with over thirty years of experience.It can be used for heat treatment such as oxidation, diffusion, シャッフルカジノling of 200mm silicon wafers.
Model | シャッフルカジノ3-50 | シャッフルカジノ3-125 | シャッフルカジノ4-125 |
Process | Oxidation, diffusion, anneal | ||
Wafer size | ~200mm (8 inch) | ||
Number of tube | 3 | 3 | 4 |
Product load | 50 | 125 | 125 |
Temp. control zone | 5 | ||
Heater material | Fe-Cr-Al | ||
Operation Temp(℃) | 600~1200 | ||
Soaking zone(mm) | 370 | 800 | 800 |
Temp. uniformity(℃) | ±1.0 |
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5. Notification シャッフルカジノ ウィークリー